Observation of Brass / Rubber Adhesion Interface Using X-ray High Resolution Photoelectron Spectroscopy.

English Abstract

Observation of Brass / Rubber Adhesion Interface Using X-ray High Resolution Photoelectron Spectroscopy.

Katsunori SHIMIZU ^*1

Takashi KAKUBO ^*1

Naoya AMINO ^*1

Kenichi OZAWA ^*2

^*1:The Yokohama Rubber Co., Ltd., Hiratsuka, Kanagawa, Japan

^*2:Department of Chemistry and Materials Science, Tokyo Institute of Technology, Meguro-ku, Tokyo, Japan

Nippon Gomu Kyokaishi,(2015),88(8),291-296 Original Paper in Japanese

Observation of adhesion layer between rubber and brass was done by using X-ray high resolution photoelectron spectroscopy. This study focuses on formation of sulfur derivatives in the adhesion layer during sulfuration reaction. Formation of Cu_xS (≃2) in the adhesion layer was observed at the very beginning of vulcanization. In addition, the amount of Cu_xS (≃2) was especially on the outermost surface of the adhesion layer, resulting from the reaction between copper and sulfur in rubber. Then Cu_xS (≃2) chemically changed to CuS in the deep part of the adhesion layer due to a presence of excess sulfur. Finally, ZnS was also formed in the deep part of the adhesion layer, as the vulcanization reaction excessively proceeded. The change of the chemical composition and distribution in the interface layer was observed by direct observation of S2p spectra using PES and XPS.

(Received on February 2, 2015)
(Accepted on May 28, 2015)

Keywords: Photoelectron Spectroscopy, Synchrotron, Rubber, Brass, Adhesion, Copper Sulfide